JINTAI gas diffuser is a porous metal component developed for controlled gas introduction into semiconductor equipment chambers. It supports rapid pressure equalization between the chamber and the external environment, helping reduce venting time and improve equipment throughput.
Its porous structure distributes concentrated incoming gas into a more uniform laminar flow, reducing direct disturbance to the wafer. The diffuser also provides particle-control capability and is stated to capture incoming particulate impurities larger than 3 nm.
Metal Gas Diffuser enables rapid pressure equalization between the equipment chamber and the external environment, thereby shortening process cycles and increasing equipment throughput. The diffuser constrains the gas to achieve uniform laminar flow, minimizing any impact on the wafer. At the same time, it features an efficient filtration structure that captures particulate impurities larger than 3 nm in the incoming gas, significantly reducing defects on the wafer.
The diffuser supports faster pressure balancing between the equipment chamber and the surrounding environment. This can help shorten chamber venting cycles when the component is correctly matched to the required gas flow and pressure conditions.
The porous media distributes gas across the available surface rather than directing it through one concentrated opening. This supports a more stable and uniform gas flow inside the chamber.
Reduced gas-jet intensity helps limit direct airflow impact on wafers and other contamination-sensitive components.
The current product page states that the diffuser captures particulate impurities larger than 3 nm in the incoming gas. The corresponding filtration efficiency, test gas, flow and differential-pressure conditions should be confirmed during technical review.
The all-metal porous structure is designed for stable gas distribution over repeated operating cycles. Actual service life depends on gas cleanliness, operating pressure, temperature and contamination loading.
| Product Type | Porous metal gas diffuser |
| Main Functions | Pressure equalization, gas distribution and particle control |
| Flow Characteristic | Uniform laminar flow |
| Published Particle Control | Captures incoming particles larger than 3 nm |
| Material | Selected according to gas compatibility and project requirements |
| Dimensions | Customizable according to chamber and installation space |
| Target Flow Rate | Defined according to chamber volume and venting requirement |
| Pressure Drop | Confirmed according to flow and porous structure |
| Operating Pressure | Project-specific |
| Operating Temperature | Project-specific |
| Connection or Mounting | Customized according to equipment interface |
| Inspection Requirements | Confirm during quotation |
When gas enters a chamber through a concentrated inlet, local velocity and turbulence may disturb particles or create uneven flow around sensitive surfaces.
The porous structure of the JINTAI gas diffuser divides the incoming gas across many small flow paths. This helps:
Distribute gas over a wider area
Reduce concentrated gas jets
Produce more uniform laminar flow
Support chamber pressure equalization
Minimize disturbance near the wafer
Reduce incoming particulate contamination
The final flow pattern depends on the diffuser geometry, porous structure, pressure difference, gas flow and chamber design.
