The metal gas diffuser enables rapid pressure equalization between the equipment chamber and the external environment, thereby shortening process cycles and increasing equipment throughput. The diffuser constrains the gas to achieve uniform laminar flow, minimizing any impact on the wafer. At the same time, it features an efficient filtration structure that captures particulate impurities larger than 3 nm in the incoming gas, significantly reducing defects on the wafer.
Rapid diffusion
Laminar flow
Low disturbance
Long-term stability
