JINTAI provides porous metal components for high-purity gas filtration, flow distribution and precision flow control. The product range includes gas diffusers, gas flow restrictors and high purity gas filter elements for semiconductor process equipment, gas delivery lines and vacuum systems.
Each component performs a different function within the gas system. Gas diffusers help equalize chamber pressure and distribute incoming gas more uniformly. Gas flow restrictors control or limit gas flow under defined operating conditions. High purity gas filter elements remove particulate contaminants before the gas reaches sensitive equipment or process areas.
The gas diffuser distributes incoming gas more evenly and supports rapid chamber pressure equalization. Its porous structure helps create uniform laminar flow, reduce airflow disturbance near wafers and capture incoming particles larger than 3 nm.
The gas flow restrictor limits or stabilizes gas flow within high-purity gas systems. It uses a 316L stainless steel porous structure and can be customized for flow requirements ranging from 5 sccm to 150 slpm under specified gas and pressure conditions.
The high purity gas filter element removes particulate contamination from semiconductor process gas, bulk gas and vacuum systems. Available media include 316L stainless steel and nickel-based alloys, with filtration ratings down to 3 nm and an optional asymmetric structure for higher flow capacity.
A gas diffuser is appropriate when concentrated gas entering a process chamber must be distributed more evenly. It can also support faster pressure equalization while reducing direct gas disturbance near wafers or other sensitive surfaces.
Important selection factors include:
Chamber size and internal geometry
Required pressure equalization time
Gas flow rate
Inlet and chamber pressure
Allowable pressure drop
Installation position
Connection and mounting method
A porous metal gas flow restrictor provides controlled resistance within a gas line. It can be customized around a specified flow requirement, but the target flow must be defined together with the gas, inlet pressure, outlet pressure and temperature.
A flow value stated without these operating conditions is not sufficient for engineering selection.
High purity gas filter elements are used where particulate contamination may affect process stability, equipment reliability or product quality.
Selection should consider both filtration rating and pressure drop. A finer filter is not automatically the best option when the required gas flow is high or the available pressure difference is limited.
JINTAI gas filtration and flow-control components can be engineered for:
Semiconductor process equipment
Wafer processing chambers
High-purity gas delivery systems
Bulk and process gas lines
Point-of-use particle filtration
Vacuum equipment
Purge gas circuits
Microelectronics manufacturing equipment
Analytical and precision gas instruments
The company identifies electronics and microelectronics among the industries served by its porous metal materials and filtration products.
JINTAI can develop porous metal gas components around the operating requirements of the customer’s system.
Customization may include:
Porous metal material
Filtration rating
Target gas flow
Pressure-drop characteristics
Outside diameter and length
Component geometry
Connection or mounting structure
Standard or asymmetric porous structure
Gas-contact material
Installation-space limitations
JINTAI has specialized in metal porous materials and related technologies since 1994. The company states that it has 15 invention and utility model patents and has passed ISO 9001 quality management system certification. Materials and product specifications can be developed according to different customer requirements.
